領域 MC-ICF · 積體電路廠工程
積體電路廠 工程
從無塵室圍護到製程設備接管——我們打造半導體製造設施。ISO Class 1-8 無塵室、18.2 MOhm-cm 超純水、化學品和氣體輸送、廢氣處理及即時廠務監控。
ISO Class 1
無塵室等級
18.2 MΩ·cm
超純水電阻率
24-52 wks
建設週期
從無塵室圍護到製程設備接管——我們打造半導體製造設施。ISO Class 1-8 無塵室、18.2 MOhm-cm 超純水、化學品和氣體輸送、廢氣處理及即時廠務監控。
ISO Class 1-8 cleanrooms with laminar flow, fan filter units (FFU), air showers, pass-throughs, gowning areas, and ESD-safe flooring.
Process tool connections: gas, chemical, UPW, exhaust, electrical, and data. Valve manifold boxes (VMB) and interface units (VMB/IU) for all tools.
UPW generation: pretreatment, reverse osmosis, ion exchange, membrane degas, and final polishing to 18.2 MOhm-cm resistivity with TOC < 1 ppb.
化学品与气体输送
排气与减排
Real-time cleanroom monitoring: particle count, temperature, humidity, pressure differential, utility status, and alarm management with SCADA integration.
| Specification | Value | Notes |
|---|---|---|
| Cleanroom Class | ISO Class 1-8 | Laminar / turbulent flow |
| UPW Resistivity | 18.2 MOhm-cm | TOC < 1 ppb, particles < 0.05um |
| UPW Capacity | Up to 200 m3/hr | Multi-stage RO + DI |
| Chemical Delivery | Acid, base, solvent | Bulk + point-of-use |
| Gas Systems | Process, inert, toxic | Gas cabinets + VMB |
| Abatement | Scrubber + thermal | PFC, SiH4, acid gas |
| Build Timeline | 24-52 weeks | From design to qualification |
| Standards | SEMI S2, F57, E10 | Semiconductor industry |
現場採樣、流量測量及現有基礎設施與排放要求分析。
處理工藝選擇、設備選型、3D佈局及冗餘分析水力建模。
內部團隊執行機械、電氣及控制系統安裝，遵循FAT/SAT協議。
性能驗證、優化、操作員培訓及完整文件包。